Electron beam sensitive resist of an anhydride copolymer

Details Electron beam sensitive resist of an anhydride copolymer Electron beam sensitive resist of an anhydride copolymer

1982-05-24

1983-03-01

Seccuro, Carman J.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

525256, 525259, 525285, 20415916, 430296, 430287, C08F26502, C08L 3508

Patent

active

043753981

ABSTRACT:
This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

REFERENCES:
patent: 3475515 (1969-10-01), Blatz et al.
patent: 3703402 (1972-11-01), Cole
patent: 3857822 (1974-12-01), Frass
patent: 4001016 (1977-01-01), Rosenkranz et al.

Affiliated with

Also associated with

Rating

Electron beam sensitive resist of an anhydride copolymer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam sensitive resist of an anhydride copolymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam sensitive resist of an anhydride copolymer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1459477