Radiation imagery chemistry: process – composition – or product th – Color imaging process – Laser or radiation exposure other than visible light
Patent
1995-02-27
1996-05-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Color imaging process
Laser or radiation exposure other than visible light
430529, 430530, 430533, 430537, 430942, 430950, G03C 700, G03C 185, G03C 176
Patent
active
055188672
ABSTRACT:
An electron-beam-recording process comprises the steps of (1) providing an electron-beam-recording element, (2) introducing the element into a vacuum chamber, (3) imagewise exposing the element within the vacuum chamber to an electron beam and (4) processing the imagewise-exposed element to form a visible image. The electron-beam-recording element comprises a film support having, in order, on one side thereof a conductive layer comprising vanadium pentoxide, an adhesion-promoting hydrophilic colloid layer and an imaging layer. The imaging layer is comprised of an electron-beam-sensitive silver halide emulsion and the vanadium pentoxide is present in the conductive layer in an amount sufficient to impart thereto a resistivity of less than 5.times.10.sup.8 .OMEGA./sq.
REFERENCES:
patent: 3428451 (1969-02-01), Trevoy
patent: 4203769 (1980-05-01), Guestaux
patent: 4495276 (1985-01-01), Takimoto et al.
patent: 4837135 (1989-06-01), Milner
patent: 5006451 (1991-04-01), Anderson et al.
patent: 5221598 (1993-06-01), Anderson et al.
patent: 5310640 (1994-05-01), Markin et al.
patent: 5340676 (1994-08-01), Anderson et al.
patent: 5360706 (1994-11-01), Anderson et al.
patent: 5366855 (1994-11-01), Anderson et al.
patent: 5439785 (1995-08-01), Boston et al.
patent: 5455153 (1995-10-01), Gardner
patent: 5466567 (1995-11-01), Anderson et al.
Anderson Charles C.
Jennings David F.
Niemeyer David A.
Bowers Jr. Charles L.
Eastman Kodak Company
Lorenzo Alfred P.
Pasterczynk J.
LandOfFree
Electron beam recording process utilizing an electron beam recor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam recording process utilizing an electron beam recor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam recording process utilizing an electron beam recor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2037027