Electron beam recording medium comprising 1-methylvinyl methyl k

Details Electron beam recording medium comprising 1-methylvinyl methyl k Electron beam recording medium comprising 1-methylvinyl methyl k

1975-08-14

1977-03-15

Kimlin, Edward C.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96 67, 96115R, 96 36, 20415914, 20415918, 20415921, 427 44, B05C 500, G03C 168

Patent

active

040125360

ABSTRACT:
Recording medium comprising a film of a polymer of 1-methylvinyl methyl ketone on a support is suitable for recording information with electron beams. This recording medium has high resolution and good sensitivity.

REFERENCES:
patent: 2892712 (1959-06-01), Plambeck
patent: 3201239 (1965-08-01), Neugebauer et al.
patent: 3544790 (1970-12-01), Brown
patent: 3661582 (1972-05-01), Broyde
patent: 3674591 (1972-07-01), Boyd
patent: 3764501 (1973-10-01), Hori et al.
patent: 3769023 (1973-10-01), Lewis et al.
patent: 3770433 (1973-11-01), Bartelt
patent: 3794510 (1974-02-01), Scala et al.
patent: 3808155 (1974-04-01), Broyde
patent: 3914462 (1975-10-01), Morisnita et al.
patent: 3931435 (1976-01-01), Gipstein et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 3940507 (1976-02-01), Fech et al.
Wissbrun, "The Photolysis of Polymethylvinyl Ketone and Polymethyl Isoproponyl Ketone," JACS, v. 81, 1959, p. 58.

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