Electron beam projection mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Details

C430S296000, C430S942000

Reexamination Certificate

active

06887626

ABSTRACT:
The batch projection regions and of an electron beam projection mask are arranged so that pattern density may be equalized on the whole wafer surface.

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patent: 09-320960 (1997-12-01), None
patent: 2000-058446 (2000-02-01), None
patent: 1998-079377 (1998-11-01), None

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