Electron-beam-projection-exposure apparatus with integrated mask

Photocopying – Projection printing and copying cameras – Illumination systems or details

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Details

2504922, G03B 2754, A61N 500

Patent

active

060380152

ABSTRACT:
Electron-beam projection-exposure apparatus are disclosed that allow a mask pattern to be transferred to a sensitized substrate without defects. An apparatus includes an electron-beam scanner, housed in a vacuum chamber, that scans an electron beam over the mask. As the mask is scanned, an emitted-electron detector senses electrons emitted from the mask at a point of contamination. The contamination is then removed from the mask by a mask-cleaning system, after which the mask is used for exposing a sensitized substrate. The scanner as well as the mask-cleaning system are housed in the same vacuum chamber where projection-exposure of the substrate are performed. Thus, the mask is not exposed to the external environment during inspection, cleaning, and projection-exposure, and inspection, cleaning and projection-exposure of the mask are performed more rapidly than conventionally. The mask-cleaning system, which can utilize a laser beam or a locally delivered reactive gas, cleans the mask at only the points of contamination, rather than the entire mask. Thus, cleaning time is shortened.

REFERENCES:
patent: 4980536 (1990-12-01), Asch et al.
patent: 5043299 (1991-08-01), Chang et al.
patent: 5798196 (1998-08-01), Okino
patent: 5799104 (1998-08-01), Nakamura et al.
patent: 5892237 (1999-04-01), Kawakami et al.

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