Electron beam processing method

Details Electron beam processing method Electron beam processing method

2006-03-28

2006-03-28

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Electromagnetic or particulate radiation utilized

C427S248100, C427S255500, C438S401000

Reexamination Certificate

active

07018683

ABSTRACT:
A microscopic projection or a characteristic pattern are formed in the vicinity of a region to be processed before processing using electron beam CVD, during processing an image of a region containing the projection or pattern formed by electron beam CVD is captured to obtain a current position of the projection or pattern, a difference between the position before staring and the current position is treated as a drift amount and processing is restarted at a region that has been subjected to microscopic adjustment of the electron irradiation region.

REFERENCES:
patent: 5171992 (1992-12-01), Clabes et al.
patent: 6706609 (2004-03-01), Boulin et al.
patent: 63305358 (1988-12-01), None

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