Coating processes – Direct application of electrical – magnetic – wave – or... – Electromagnetic or particulate radiation utilized
Reexamination Certificate
2006-10-31
2006-10-31
Chen, Bret (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electromagnetic or particulate radiation utilized
C427S596000, C427S597000
Reexamination Certificate
active
07128950
ABSTRACT:
An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.
REFERENCES:
patent: 3526206 (1970-09-01), Jones
patent: 4401719 (1983-08-01), Kobayashi et al.
patent: 4988844 (1991-01-01), Dietrich et al.
patent: 5698273 (1997-12-01), Azad et al.
patent: 5726919 (1998-03-01), Azad et al.
patent: 5773078 (1998-06-01), Skelly
patent: 5834070 (1998-11-01), Movchan et al.
patent: 6589351 (2003-07-01), Bruce et al.
patent: 6620465 (2003-09-01), Rigney et al.
patent: 6770333 (2004-08-01), Bruce et al.
patent: 6849299 (2005-02-01), Corderman et al.
patent: 6863937 (2005-03-01), Bruce et al.
patent: 2005/0208337 (2005-09-01), Ulion et al.
patent: 2006/0055321 (2006-03-01), Maldonado et al.
Bruce Robert William
Evans, Sr. John Douglas
Chen Bret
General Electric Company
Hartman Domenica N. S.
Hartman Gary M.
Narciso David L.
LandOfFree
Electron beam physical vapor deposition process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam physical vapor deposition process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam physical vapor deposition process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3710560