Electron beam physical vapor deposition method

Details Electron beam physical vapor deposition method Electron beam physical vapor deposition method

1995-11-24

1997-12-16

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427567, 427124, 4271261, B05D 306

Patent

active

056982739

ABSTRACT:
A method is disclosed for operating an electron beam physical vapor deposition apparatus including a vacuum chamber containing an ingot disposed in a crucible, a workpiece disposed above the ingot, and an electron gun for emitting an electron beam to melt and vaporize the ingot to disperse vapors for deposition coating of the workpiece. The method includes directing a primary electron beam with a primary beam focus in a primary scanning pattern across a top surface of the ingot to melt and vaporize the ingot and develop an ingot melt pool floating atop an underlying ingot substrate. A secondary electron beam is superimposed across the ingot top surface in conjunction with the primary electron beam. The secondary electron beam has a secondary beam focus in a secondary scanning pattern to locally and transiently increase vaporization rate of the melt pool.

REFERENCES:
patent: 5296274 (1994-03-01), Movchan et al.
patent: 5418003 (1995-05-01), Bruce et al.
patent: 5436035 (1995-07-01), Lohwasser

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