Electron beam microfabrication apparatus and method

Details Electron beam microfabrication apparatus and method Electron beam microfabrication apparatus and method

1979-02-21

1980-10-07

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250310, 250492R, A61K 2702, B01J 110, G01N 2300

Patent

active

042270901

ABSTRACT:
Electron beam microfabrication apparatus has spherically concave photocathode pattern 40 which when excited produces patterned electron beam 48 which is accelerated by electrode 44 and magnetically focused by magnet 58 to impinge as a demagnified patterned field 60 on a photoresist carrying semiconductor wafer 36 mounted of wafer holder 34.

REFERENCES:
patent: 3551734 (1970-12-01), O'Keeffe
patent: 4039810 (1977-08-01), Heritage
patent: 4145615 (1979-03-01), Sumi

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