Electron beam method and apparatus for reducing or...

Details Electron beam method and apparatus for reducing or... Electron beam method and apparatus for reducing or...

2008-05-13

2008-05-13

Berman, Jack (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492100, C250S492200, C438S031000, C438S032000, C427S542000

Reexamination Certificate

active

11242469

ABSTRACT:
A controlled electron beam and heat will decrease the birefringence of a halogenated optical material under tensile stress. The electron beam and heat irradiation will occur in a chamber under near vacuum conditions. After electron beam irradiation and heating, the crystalline structure of the halogenated optical material layer has been randomized and made amorphous. The electron beam irradiation and heating will lower the high index of refraction of the halogenated optical material under stress and raise the low index of refraction of the halogenated optical material under stress. The differences in index of refraction between the high index of refraction area of and the low index of refraction area decrease which decreases the birefringence of the halogenated optical material under stress.

REFERENCES:
patent: 5003178 (1991-03-01), Livesay
patent: 5572619 (1996-11-01), Maruo et al.
patent: 6132814 (2000-10-01), Livesay et al.
patent: 6607991 (2003-08-01), Livesay et al.
patent: 7026634 (2006-04-01), Livesay et al.

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