Electron beam memory system with improved high rate digital beam

Details Electron beam memory system with improved high rate digital beam Electron beam memory system with improved high rate digital beam

1986-02-03

1988-08-16

Richardson, Robert L.

Facsimile and static presentation processing

Facsimile

Recording apparatus

369101, 365118, 346158, 315382, G11B 900

Patent

active

047648180

ABSTRACT:
An electron beam memory system comprises a substrate mounted for rotation and supporting an information storage medium. Means are provided for rotating the substrate. An electron gun comprises a field emission cathode having an emitting tip, anode means, and means for developing and applying between the tip and the anode means a predetermined accelerating potential for forming a high brightness electron source at the tip and for causing an electron beam to be formed through the anode means. The gun includes focus lens means for receiving the beam and for forming a very small yet intense electron beam probe at a predetermined first focal distance therefrom. A high rate digital beam pulsing system comprises voltage pulse generating means for developing a series of voltage pulses of predetermined magnitude and duration, and means for applying the pulses to the gun such that the pulses add to or subtract from the accelerating potential to thereby cause the focus lens means to focus the beam at a predetermined second focal distance different from the first focal distance. The gun is positioned relative to the recording medium such that one of the first and second focal distances corresponds to the distance between the focus lens means and the recording medium.

REFERENCES:
patent: 3721962 (1973-03-01), Foster et al.
patent: 3748467 (1973-07-01), Suganuma
patent: 3919550 (1975-11-01), Banbury
patent: 3937959 (1976-02-01), Namae
patent: 4074313 (1978-02-01), Reisner et al.
patent: 4090253 (1978-05-01), Salgo
patent: 4245159 (1981-01-01), Beisswenger

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