Electron beam matrix deflector and method of fabrication

Details Electron beam matrix deflector and method of fabrication Electron beam matrix deflector and method of fabrication

1979-07-27

1981-06-30

Herbert, Jr., Thomas J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Including aperture

29 2516, 29 2518, 156643, 156663, 313429, 428136, 428450, 428472, 428901, B32B 310, H01J 918

Patent

active

042763355

ABSTRACT:
A matrix deflector, for deflecting an electron beam passing therethrough, is fabricated of a pair of members of photosensitive insulating material which are each exposed to a pattern of photons, and then developed to form a pattern of substantially parallel slots through each member; the members are positioned one above the other with the slots thereof orthogonally arrayed. The slots diverge in the direction of electron beam passage through each member to provide an exit aperture wider than the entrance aperture and prevent the deflected beam from striking the edge of the lens member at maximum deflection. The apertures form a set of parallel bars which are coated with a conductive material to facilitate production of deflecting electrostatic fields within each slot.

REFERENCES:
patent: 2628160 (1953-02-01), Stoakes
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patent: 3534219 (1970-10-01), Newberry
patent: 3534219 (1970-10-01), Newberry
patent: 3680184 (1972-08-01), Greene
patent: 3687664 (1972-08-01), Broadbent
patent: 3713921 (1973-01-01), Fleischer et al.
patent: 3802972 (1974-04-01), Fleisher et al.
patent: 4160311 (1979-07-01), Ronde et al.
patent: 4164059 (1979-08-01), Esdonk
patent: 4182010 (1980-01-01), Lemmond

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