Electron beam lithography system, method of electron beam...

Details Electron beam lithography system, method of electron beam... Electron beam lithography system, method of electron beam...

2007-10-16

2007-10-16

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000

Reexamination Certificate

active

11097357

ABSTRACT:
An electron beam lithography system includes: a lithography tool writing patterns onto substrates, which are classified into lots, respectively, using sequentially apertures through which electron beams, based on a specific processing procedures; an aperture manager managing the apertures; a request obtaining module obtaining processing requests of the lots; a processing procedure storing file storing processing procedures; a processing time calculating module calculating corresponding processing times of the lots using the apertures based on corresponding processing procedures defined for each of the lots; and an order deciding module deciding an order of processing the lots based on the processing times.

REFERENCES:
patent: 5141830 (1992-08-01), Komagata
patent: 6225025 (2001-05-01), Hoshino
patent: 6393604 (2002-05-01), Yamada et al.
patent: 6657211 (2003-12-01), Benner
patent: 6674086 (2004-01-01), Kamada et al.
patent: 6803589 (2004-10-01), Nakasugi
patent: 2002/0017708 (2002-02-01), Takagi et al.
patent: 2002/0173868 (2002-11-01), Mukuta et al.
patent: 2003/0089685 (2003-05-01), Ando
patent: 2003/0160192 (2003-08-01), Inanami et al.
patent: 2004/0011966 (2004-01-01), Sasaki et al.
patent: 2004/0065848 (2004-04-01), Onishi et al.
patent: 2005/0208772 (2005-09-01), Inanami
Tominaga, T. et al. “Scheduling in electron-beam direct writing system employing character projection exposure method”, Proceeding of LSI Testing Symposium 2004 (Japan) 7 pages, Nov. 2004.

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