Electron beam lithography system having improved electron gun

Details Electron beam lithography system having improved electron gun Electron beam lithography system having improved electron gun

2006-08-22

2006-08-22

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C313S542000, C313S530000, C313S531000, C313S539000, C313S541000, C313S544000

Reexamination Certificate

active

07095037

ABSTRACT:
An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

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