Electron beam lithography system

Details Electron beam lithography system Electron beam lithography system

1988-12-15

1990-07-24

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250398, H01J 3730

Patent

active

049437291

ABSTRACT:
An electron beam lithography system having a contour resolving circuit for resolving original pattern data which is transferred from a host computer into contour portion pattern data and inner portion pattern data in accordance with the designated dimension, for adding flag data to enable the contour portion pattern data and the inner portion pattern data to be discriminated to the resolved pattern data, and for outputting the resolved pattern data with the flag data. By adding the flag data, the contour portion pattern data and inner portion pattern data can be easily discriminated. The operation to change the electron beam irradiation dose in accordance with the contour portion pattern and inner portion pattern can be fairly easily executed. A pattern can be drawn at a high accuracy while preventing a deformation of the drawn figure due to the proximity effect. A data processing amount in the computer can be reduced. A data transfer amount from the host computer can be also reduced. Thus, an electron beam lithography system having a high throughput can be realized.

REFERENCES:
patent: 4520269 (1985-05-01), Jones

Affiliated with

Also associated with

Rating

Electron beam lithography system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam lithography system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam lithography system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1269046