Electron beam lithography system

Details Electron beam lithography system Electron beam lithography system

1991-12-02

1992-11-24

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 2730

Patent

active

051665298

ABSTRACT:
An electron beam lithography apparatus, comprising an electron beam source for irradiating an electron beam on a specimen surface, a deflectional controller of the electron beam, a focal controller of the electron beam on the specimen surface, a light source which irradiates two monochromatic lights on the surface having wavelengths which are different a half thereof each other, a signal processor for obtaining correction values in a height direction of the beam based on the reflected lights from the surface, and a means for adjusting the focal controller according to the correction values in the height direction. As the wavelengths of the two monochromatic lights on the surface are different in a half wavelength each other, an interference caused by a photo-resist on the specimen is prevented.

REFERENCES:
patent: 4334139 (1982-06-01), Wittekock et al.
patent: 4468565 (1984-08-01), Blair et al.
patent: 4821196 (1989-04-01), Coppolpy et al.
patent: 5025165 (1991-06-01), Chen et al.
patent: 5074667 (1991-12-01), Miyatake
patent: 5094536 (1992-03-01), MacDonald et al.

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