Electron beam lithography method

Details Electron beam lithography method Electron beam lithography method

1992-10-21

1994-02-08

Dzierzynski, Paul M.

Radiant energy

Means to align or position an object relative to a source or...

H01J 37304

Patent

active

052850757

ABSTRACT:
A sample stage is moved so that an alignment mark on a wafer successively move on positions symmetric to the positional origin of the electron beam, and waveformes of signals obtained by scanning the alignment mark at the symmetric positions with electron beam are added each other so as to be symmetry and decrease the alignment-mark position detecting error.

REFERENCES:
patent: 4546260 (1985-10-01), Simpson et al.
patent: 4808829 (1989-02-01), Okumura et al.

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