Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1989-09-13
1990-11-27
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504923, 250396R, 250396ML, G21K 510
Patent
active
049738496
ABSTRACT:
An electron beam lithography apparatus having an external magnetic field correcting device comprises an electron gun for irradiating an electron beam onto a semiconductor wafer, a electron beam column made from a high magnetic permeability material disposed around the electron beam, a coil equipped on the electron beam column, a magnetic sensor for detecting an external magnetic field which is disposed at the outside of the electron beam column, a stage for mounting and moving the semiconductor wafer, a position detecting means for detecting the position mark on the stage, a correcting device for generating a correcting signal based on the outputs from the magnetic sensor and the position detecting means, and a current adjusting device for adjusting a correcting current flown into the coil according to the correcting signal from the correcting device so as to compensate a rotational deviation of the electron beam caused by the external magnetic field. The electron beam lithography apparatus is obtained at a low cost and results in high positioning accuracy without requiring a covering of a high magnetic permeability material around the electron beam lithography apparatus.
REFERENCES:
patent: 3699304 (1972-10-01), Baldwin, Jr. et al.
patent: 3984687 (1976-10-01), Loeffler et al.
patent: 4084095 (1978-04-01), Wolfe
patent: 4119854 (1978-10-01), Tanaka et al.
patent: 4151422 (1979-04-01), Goto et al.
patent: 4362942 (1982-12-01), Yasuda
patent: 4396901 (1983-08-01), Saitou et al.
patent: 4647782 (1987-03-01), Wada et al.
patent: 4661712 (1987-04-01), Mobley
patent: 4701623 (1987-10-01), Beasley
patent: 4806766 (1989-02-01), Chisholm
patent: 4845370 (1989-07-01), Thompson et al.
Nakamura Kazumitsu
Yoshinari Yukio
Berman Jack I.
Hitachi , Ltd.
Nguyen Kiet T.
LandOfFree
Electron beam lithography apparatus having external magnetic fie does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam lithography apparatus having external magnetic fie, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam lithography apparatus having external magnetic fie will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1033626