Electron beam lithography apparatus and method for...

Details Electron beam lithography apparatus and method for... Electron beam lithography apparatus and method for...

2007-09-06

2010-10-05

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S491100, C250S492220, C360S135000, C430S296000, C430S942000, C369S101000

Reexamination Certificate

active

07807988

ABSTRACT:
Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.

REFERENCES:
patent: 5389858 (1995-02-01), Langner et al.
patent: 5892230 (1999-04-01), Goodberlet et al.
patent: 7026098 (2006-04-01), Komatsu et al.
patent: 2004/0091817 (2004-05-01), Komatsu et al.
patent: 1 418 576 (2004-05-01), None
patent: 2004-158287 (2004-06-01), None
patent: 10-2004-0040372 (2004-05-01), None

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