Electron beam lithography apparatus

Details Electron beam lithography apparatus Electron beam lithography apparatus

1985-05-17

1987-09-08

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3700

Patent

active

046925791

ABSTRACT:
An electron beam lithography apparatus comprises: a spot electron beam generator; device for exposing a desired pattern onto a wafer using the spot beam; device for dividing the pattern into small regions; and device for designating an origin of the small region and also digitally scanning the portion inside the small region by a fixed correction amount by use of the spot beam, and thereby to reduce the settling time of the D/A converter in association with the digital scanning.

REFERENCES:
patent: 4199689 (1980-04-01), Takigawa
patent: 4494004 (1985-01-01), Mauer et al.
patent: 4511980 (1985-04-01), Watanabe
patent: 4586141 (1986-04-01), Yasuda et al.

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