Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1992-11-05
1993-05-25
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250400, 25044111, 25044211, H01J 3720
Patent
active
052142906
ABSTRACT:
Disclosed is an electron beam lithography apparatus comprising means for emitting an electron beam and directing it toward and onto a workpiece, means for deflecting and turning on-off the electron beam so as to form a predetermined pattern on the workpiece, a vacuum column disposed to expose the electron beam to a vacuum, a workpiece stage including a first table supporting the workpiece and a second table supporting the first table, means for moving the first table in one of the X-axis and Y-axis directions and moving the second table in the other direction, a vacuum workpiece chamber disposed to make vacuum communication with the vacuum column and to accommodate both of the workpiece and the workpiece stage, and means for supporting both of the workpiece stage and the workpiece moving means, the vacuum workpiece chamber being partly opened, and the supporting means being detachably mounted on the opening of the vacuum workpiece chamber.
REFERENCES:
patent: Re31630 (1984-07-01), Goto et al.
patent: 2860251 (1958-11-01), Pakswer et al.
patent: 3638015 (1972-01-01), Browning et al.
patent: 4718019 (1988-01-01), Filliou et al.
Berman Jack I.
Beyer Jim
Hitachi , Ltd.
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