Electron beam lithography

Details Electron beam lithography Electron beam lithography

1985-07-22

1987-12-01

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

219121ER, H01J 3700

Patent

active

047106409

ABSTRACT:
An electron beam lithograhy apparatus capable of uniformly exposing the surface of a sample by an electron beam including a generator for generating the electron beam, members for shaping the electron beam, members for focusing the shaped electron beam on the surface of the sample, devices for permitting the focused electron beam to scan the surface of the sample, and devices for deflecting the electron beam to blank, unblank and blank in turn, wherein when the electrom beam is deflected in one direction, a sequence of blanking, unblanking and blanking is made of the beam.

REFERENCES:
patent: 3894271 (1975-07-01), Pfeiffer et al.
patent: 4151417 (1979-04-01), Takigawa
patent: 4423305 (1983-12-01), Pfeiffer
patent: 4433384 (1984-02-01), Berrian
patent: 4445041 (1984-04-01), Kelly et al.
patent: 4494004 (1985-01-01), Mauer et al.

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