Electron-beam lithographic apparatus

Details Electron-beam lithographic apparatus Electron-beam lithographic apparatus

1989-04-20

1991-02-26

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

364491, H01J 3730

Patent

active

049964348

ABSTRACT:
This invention provides an electron-beam lithographic apparatus in which a predetermined pattern is written on a plate and which has an arrangement for detecting defects in a written pattern. This apparatus includes an apparatus body in which a predetermined pattern is written on a plate, a storage unit for storing therein design data, a CPU for controlling the apparatus body and an interface disposed between the CPU and the apparatus body. The interface includes an unit arranged to detect defects in the pattern formed on a mask by comparing the design data with picked-up image pattern data relative to the mask.

REFERENCES:
patent: 3922546 (1975-11-01), Livesay
patent: 4357540 (1982-11-01), Benjamin et al.
patent: 4365163 (1982-12-01), Davis et al.

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