Electron beam lens for micro-column electron beam apparatus...

Details Electron beam lens for micro-column electron beam apparatus... Electron beam lens for micro-column electron beam apparatus...

2007-12-11

2007-12-11

Nguyen, Kiet T. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C445S046000, C029S825000

Reexamination Certificate

active

11174916

ABSTRACT:
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

REFERENCES:
patent: 5535508 (1996-07-01), Nagai et al.
patent: 6996896 (2006-02-01), Choi et al.
patent: 7230251 (2007-06-01), Choi et al.
J. Vac. Sci. Technol. B 12(b) Nov./Dec. 1994, pp. 3425-3430.

Affiliated with

Also associated with

Rating

Electron beam lens for micro-column electron beam apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam lens for micro-column electron beam apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam lens for micro-column electron beam apparatus... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3841105