Electron beam lens for micro-column electron beam apparatus...

Details Electron beam lens for micro-column electron beam apparatus... Electron beam lens for micro-column electron beam apparatus...

2007-06-12

2007-06-12

Lee, John R. (Department: 2878)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C445S046000, C029S825000

Reexamination Certificate

active

11174891

ABSTRACT:
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.

REFERENCES:
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patent: 6996896 (2006-02-01), Choi et al.
patent: 2005/0087696 (2005-04-01), Choi et al.
patent: 2005/0263712 (2005-12-01), Choi et al.
patent: 2005/0266322 (2005-12-01), Choi et al.
J. Vac. Sci. Technol. B 12(b) Nov./Dec. 1994, pp. 3425-3430.

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