Electron beam irradiation device

Details Electron beam irradiation device Electron beam irradiation device

2005-11-18

2010-11-09

Berman, Jack I (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492100, C250S492200, C250S492220, C250S492240, C250S492300

Reexamination Certificate

active

07829863

ABSTRACT:
An electron beam irradiation device of the present invention includes: a projector8for generating a two-dimensional light pattern13; a microchannel plate11for (i) generating an electron beam array based on the light pattern13having entered, (ii) amplifying the electron beam array, and (iii) emitting the electron beam array as an amplified electron beam array14; and an electron beam lens section12for converging the amplified electron beam array14. This electron beam irradiation device is capable of manufacturing a semiconductor device whose performance is improved through a finer processing by means of irradiation using an electron beam. Further, the electron beam irradiation device allows cost reduction, because the device allows collective irradiation using a two dimensional pattern.

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