Electron beam irradiation device

Details Electron beam irradiation device Electron beam irradiation device

2005-03-09

2008-10-14

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492100, C250S493100, C315S111810, C315S111010, C118S7230EB

Reexamination Certificate

active

07435980

ABSTRACT:
An electron beam irradiation device having an electron beam generating unit R, an irradiation chamber E for irradiating an electron beam to a irradiated object F, and an oxygen cutoff section S for blowing inert gas N on an upstream side of the irradiated chamber. The oxygen cutoff section is designed so that a gap Ws between partitions across the irradiated object is smaller than a gap We between the partitions across the irradiated object in the irradiation chamber (Ws<We). The gap Ws is made uniform, or almost uniform, throughout the entire area of the oxygen cutoff section, and a blowing slit55for blowing the inert gas to the processing surface of the irradiated object is provided on a partition with no projection nor recess involved.

REFERENCES:
patent: 2006/0272579 (2006-12-01), Nakao
patent: 63-8440 (1988-02-01), None
patent: 4-127597 (1992-11-01), None
patent: 5-9680 (1993-02-01), None
patent: 5-36212 (1993-05-01), None
patent: 5-060899 (1993-12-01), None
patent: 6-80200 (1994-11-01), None

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