Electron beam irradiation apparatus, electron beam...

Dynamic information storage or retrieval – Specific detail of information handling portion of system – Radiation beam modification of or by storage medium

Reexamination Certificate

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C369S143000

Reexamination Certificate

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10528518

ABSTRACT:
An electron beam irradiation apparatus and method capable of easily curing at least part of a surface layer and/or a resin layer composed of materials that are hard to be cured by irradiation of ultraviolet rays. A disc-shaped object manufacturing apparatus and method capable of efficiently forming, on the disc-shaped object, at least part of a surface layer and/or a resin layer such as light transmitting layer, etc, thereunder. An electron beam irradiation apparatus comprises a rotary driving unit for rotationally driving an object, a shield container rotatably accommodating the object, and an electron beam irradiation unit provided in the shield container so that the surface of the object is irradiated with electron beams from an irradiation window thereof, wherein the surface of the object is irritated with the electron beams during its rotation from the irradiation window of the election beam irradiation unit. The surface of the on-rotating object can be thereby irradiated with the electron beams having larger energy than the ultraviolet rays have.

REFERENCES:
patent: 6614037 (2003-09-01), Naito
patent: 6686597 (2004-02-01), Kumasaka et al.
patent: 2001/0028456 (2001-10-01), Nishi
patent: 2001-202663 (2001-07-01), None
patent: 2002-163845 (2002-06-01), None
Patent Abstracts of Japan for JP2002-163845 published on Jul. 6, 2002.
Patent Abstracts of Japan for JP2002-042384 published on Feb. 8, 2002.
Patent Abstracts of Japan for JP2001-202663 published on Jul. 27, 2001.
Patent Abstracts of Japan for JP11-288530 published on Oct. 1, 1999.
Patent Abstracts of Japan for JP04-019839 published on Jan. 23, 1992.
Patent Abstracts of Japan for JP11-162015 published on Jun. 18, 1999.
Patent Abstracts of Japan for JP07-292470 published on Nov. 7, 1995.
Patent Abstracts of Japan for JP2000-064042 published on Feb. 29, 2000.
International Search Report for PCT/JP03/11890 mailed Jan. 13, 2004.

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