Electron beam illumination device, and exposure apparatus with e

Details Electron beam illumination device, and exposure apparatus with e Electron beam illumination device, and exposure apparatus with e

1998-04-14

2000-03-14

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3730

Patent

active

060376015

ABSTRACT:
An electron beam illumination device has an electron gun for emitting an electron beam, a slit plate formed with a slit opening portion, which has the beam axis of the electron gun as the center, and a deflector for scanning the electron beam along the slit opening portion by deflecting the electron beam, and rotating or reciprocally moving the electron beam to have the beam axis as the center. The electron beam irradiation region on the mask and the exposure region on the wafer can be broadened, and the electron beam can be irradiated onto these regions at uniform irradiation intensity.

REFERENCES:
patent: 4812662 (1989-03-01), Goto et al.
patent: 4894611 (1990-01-01), Shimoda et al.
patent: 4896045 (1990-01-01), Okunuki et al.
patent: 4897552 (1990-01-01), Okunuki et al.
patent: 4974736 (1990-12-01), Okunuki et al.
patent: 5434424 (1995-07-01), Stickel et al.
patent: 5747819 (1998-05-01), Nakasuji et al.
patent: 5821542 (1998-10-01), Golladay

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