Electron beam-generating apparatus

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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H01J 37065

Patent

active

057638896

ABSTRACT:
There is disclosed an apparatus for generating an electron beam in an electron microscope comprising an electron gun, a second anode located under the gun, an aperture plate having an aperture for limiting the electron beam, and a scattered electron-blocking member for limiting passage of the beam. The aperture plate is mounted in the beam passage formed in the second anode. The scattered electron-blocking member is located under the aperture plate. Electrons scattered at the edges of the aperture are blocked by the scattered electron-blocking member from colliding against the accelerator tube.

REFERENCES:
patent: 3927321 (1975-12-01), Welter
patent: 4798957 (1989-01-01), Tolner
patent: 5241182 (1993-08-01), Martin et al.
"Computerized Electron-Beam Linewidth Measuring and Inspection: A New Tool", Tom F. Pomposo and Vincent J. Coates. Silicon Processing, pp. 501-508.

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