Electron beam exposure system method and apparatus

Details Electron beam exposure system method and apparatus Electron beam exposure system method and apparatus

1977-11-01

1979-04-03

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

A61K 2702

Patent

active

041479378

ABSTRACT:
An electron beam exposure system and method for use in the process of fabricating microminiature devices at high speeds. The high-speed operation is achieved with a computer providing programmed commands specifying a particular pattern to be scanned. A processor, responsive to programmed data, generates scan data a line at a time and loads a line generator. The line generator steps to each exposure location in a line to provide control signals for controlling the position of the electron beam. The starting and end positions of scan lines in both the X and Y directions may be arbitrarily selected thereby eliminating the need for scanning areas not intended to be processed.

REFERENCES:
patent: 3866013 (1975-02-01), Ryan
"Computer-Controlled Scanning--Pattern Fabrication" by Ozdemir et al, IEEE Trans on Electron Devices vol. ED-19 No. 5 May 1972 pp. 624-628.

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