Electron beam exposure system having an improved seal element fo

Details Electron beam exposure system having an improved seal element fo Electron beam exposure system having an improved seal element fo

1991-06-20

1992-05-26

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 313477HC, H01J 338

Patent

active

051171171

ABSTRACT:
An electron beam exposure system for writing a pattern on an object by an electron beam comprises a beam source for producing an electron beam, a beam focusing unit for focusing the electron beam on the object, a beam processing unit provided along an optical axis of the electron beam for modifying the electron beam in response to control signals, a column extending along the optical axis of the electron beam so as to surround a region that includes the object, the beam source, the beam focusing unit and the beam processing unit and for maintaining the region evacuated, and an interface element mounted on the column for supplying the control signals to said beam processing unit. The interface element comprises a ring-shaped base body of a ceramic material having first and second major surfaces, the first major surface establishing an hermetic seal to the column when the interface element is mounted thereon, one or more conductor patterns provided on the second major surface so as to extend radially from an inner circumference to an outer circumference, and an insulator film provided on the second major surface of the base body so as to bury the conductor patterns underneath. The insulator film has a substantially flat major surface and establishes an hermetic seal with the column when the interface element is mounted thereon.

REFERENCES:
patent: 4661709 (1987-04-01), Walker et al.
patent: 4701623 (1987-10-01), Beasley

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