Electron-beam exposure system for reduced distortion of electron

Details Electron-beam exposure system for reduced distortion of electron Electron-beam exposure system for reduced distortion of electron

1995-05-05

1997-05-20

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

250398, 2504922, G03L 500, H01J 3700

Patent

active

056311133

ABSTRACT:
An electron-beam exposure system includes an astigmatic compensation circuit that increases a voltage applied across a pair of electrodes forming an electrostatic sub-deflector and simultaneously decreases a voltage applied across another pair of electrodes forming the same electrostatic sub-deflector with a same magnitude as in the case of increasing the voltage, wherein the magnitude of the voltage change is changed in response to the deflection of the electron-beam caused by a main deflector.

REFERENCES:
patent: 4523098 (1985-06-01), Noma
patent: 4763004 (1988-08-01), Yasuda
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5304811 (1994-04-01), Yamada et al.
patent: 5313062 (1994-05-01), Yamada
patent: 5391886 (1995-02-01), Yamada et al.

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