Electron-beam exposure system and electron-beam exposure method

Details Electron-beam exposure system and electron-beam exposure method Electron-beam exposure system and electron-beam exposure method

2006-03-22

2008-10-28

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230

Reexamination Certificate

active

07442947

ABSTRACT:
A multicolumn electron-beam exposure system includes: a plurality of column cells, which are arranged above a wafer, and each of which includes an electron gun and deflection means which deflects an electron beam irradiated from the electron gun; common storage means which stores common exposure data used by the plurality of column cells; and size data correcting means which is provided to each of the column cells, and which receives size data on a variable-shaped beam from the common storage means, thus outputting an amount of correction to the size data. The amount of correction is the size data on the variable-shaped beam, which corresponds to the difference between the size of a resist pattern, which has been formed by specifying an intended pattern size and a reference light exposure, and the intended pattern size.

REFERENCES:
patent: 6407397 (2002-06-01), Seto

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