Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1977-05-31

1978-09-26

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250400, H01J 3720

Patent

active

041173406

ABSTRACT:
An electron beam with a cross-section shaped by two aperture plates and a deflector sequentially irradiates pattern areas within a plurality of unit squares on a workpiece in the X and Y directions. The workpiece is continuously shifted in the Y direction by a mechanical means, the amount of workpiece shift being detected to control the deflector and the shaping of said beam cross-section.

REFERENCES:
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 3922546 (1975-11-01), Livesay
patent: 4017403 (1977-04-01), Freeman

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