Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1977-11-17

1978-10-10

Smith, Alfred E.

Radiant energy

With charged particle beam deflection or focussing

With detector

250398, 250492A, H01J 3700

Patent

active

041198549

ABSTRACT:
A reference mark, common to both an electron beam and a workpiece, is arranged above and away from, but in the vicinity of, the workpiece exposure area. The position of the workpiece with respect to the reference mark is ascertained by an optical measuring means such as a Michelson type laser interferometer and the position of the electron beam with respect to the reference mark is ascertained by scanning the electron beam over said reference mark. The relative positions of the electron beam and the exposed workpiece is obtained by comparing the respective positions of the electron beam and workpiece with the reference mark. By so doing, the error between specified and actual positions of the points of impingement of the electron beam on the surface of the workpiece may be corrected.

REFERENCES:
patent: 3699334 (1972-10-01), Cohn et al.
patent: 3849659 (1974-11-01), O'Keeffe
patent: 3894271 (1975-07-01), Pfeiffer et al.
patent: 3922546 (1975-11-01), Livesay

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