Electron-beam exposure system

Details Electron-beam exposure system Electron-beam exposure system

2006-06-21

2008-05-20

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492300

Reexamination Certificate

active

07375356

ABSTRACT:
An electron-beam exposure system includes: density-per-area map generating means configured to divide a certain area on which an electron beam is irradiated into meshes, to figure out a ratio of an area of patterns to be irradiated on each divided region to an area of the divided region, thus to generate a density-per-area map; and proximity-effect correcting means configured to correct exposure of the electron beam by referring to the density-per-area map. The proximity-effect correcting means includes: product-sum arithmetic means which is configured to perform product-sum arithmetic on two-dimensional array data, and addition means which is configured to perform addition arithmetic on the two-dimensional array data; stores, in a first memory, two-dimensional array data on the density per area of the patterns; performs the product-sum arithmetic and the addition a predetermined number of times, and thus calculates the two-dimensional array data on the density per area by a linear conversion; and uses the resultant data as two-dimensional array data on exposure to be used for correcting a proximity effect.

REFERENCES:
patent: 6515409 (2003-02-01), Muraki et al.
patent: 6828573 (2004-12-01), Kawano et al.
patent: 2006/0129967 (2006-06-01), Tanaka et al.
patent: 2003-218014 (2003-07-01), None

Affiliated with

Also associated with

Rating

Electron-beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron-beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron-beam exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3986159