Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1982-06-08

1985-07-30

Thomas, James D.

Boots, shoes, and leggings

250398, 2504922, G01K 108, H01J 314, H01J 326

Patent

active

045325987

ABSTRACT:
An electron beam exposure system of a variable shaped electron beam type in which an input pattern of any geometrical shape is decomposed into rectangular patterns of a given size, whereby the pattern is exposed by an electron beam having a cross-section corresponding to the decomposed rectangular pattern. Data for the input pattern is compared with data for the rectangular cross-sectional pattern of the electron beam in a comparator. When the comparison results is that the input pattern should be decomposed into rectangular patterns, the former is decomposed into two sub-patterns, one of which is outputted while the other again undergoes the comparison with the rectangular pattern parameters. The processing of decomposition can be executed at a very high speed in a pipelined system which includes a plurality of processing stages of similar arrangement.

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patent: 4393312 (1983-07-01), Collier
patent: 4424448 (1984-01-01), Takigawa et al.
Fujinami et al., Precision Electron Beam Exposure System EB52, Review of the Electrical Communications Laboratories, vol. 27, #1-2, (1,2/79), pp. 97-104.

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