Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1982-09-30

1984-11-13

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

364490, 364491, 364520, H01J 37302

Patent

active

044828101

ABSTRACT:
A method and apparatus for reducing the number of areas multiply exposed when a workpiece is scanned by an electron beam or other exposing radiation. The areas to be exposed are described as a plurality of rectangular shapes. The method of the invention sorts the data describing the rectangles. Rectangles which overlap or abut in one direction and are coextensive in another are merged such that a smaller number of rectangles is formed. This smaller number describes an area substantially equivalent to the original pattern. The smaller number of rectangles resulting from the merging method will have a minimum of disadvantageously overlapping or abutting rectangles.

REFERENCES:
patent: 4181860 (1980-01-01), Sumi
patent: 4387433 (1983-06-01), Cardenia et al.
patent: 4433384 (1984-02-01), Berrian et al.

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