Electron beam exposure method using a moving stage

Details Electron beam exposure method using a moving stage Electron beam exposure method using a moving stage

1998-05-22

2000-03-21

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049223, 250398, H01J 37302

Patent

active

06040583&

ABSTRACT:
An electron beam exposure system has a continuous stage drive for driving a stage at a constant speed. Area of a semiconductor chip is divided into an array of unit meshes to calculate pattern density in each mesh. A group of meshes having an equal density level is combined as a sub-strip region having dimensions equal to or lower than the maximum width determined based on the ability of the electron beam exposure system.

REFERENCES:
patent: 5349197 (1994-09-01), Sakamoto et al.

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