Electron-beam exposure method and system

Details Electron-beam exposure method and system Electron-beam exposure method and system

1995-03-15

1997-03-04

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, G01J 100, G01N 2100, G01N 2300

Patent

active

056082266

ABSTRACT:
An electron-beam exposure system includes a stage on which a wafer is set, an exposure unit for exposing the wafer set on sid stage using an electron-beam, an optical detecting unit having an optical axis, and, a locating control unit for locating the stage at a target position based on a relative position of a deflection center line to the optical axis of the optical detecting means which target position is detected using a reference mark formed on the movable stage. In an electron-beam exposure method using the above electron-beam exposure system, the relative position is detected, and the target position of the movable stage is then calculated based on the relative position.

REFERENCES:
patent: 4469949 (1984-09-01), Mori et al.
patent: 4769523 (1988-09-01), Tanimoto et al.
patent: 4785187 (1988-11-01), Kariya et al.
patent: 4818885 (1989-04-01), Davis et al.
patent: 4954022 (1990-09-01), Underwood et al.
patent: 5025165 (1991-06-01), Chen et al.
patent: 5168166 (1992-12-01), Hayakawa

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