Electron beam exposure method and electron beam exposure...

Details Electron beam exposure method and electron beam exposure... Electron beam exposure method and electron beam exposure...

2007-02-13

2007-02-13

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C369S101000

Reexamination Certificate

active

10528548

ABSTRACT:
In an electron beam exposure method in which an article subjected to exposure and an electron beam irradiation spot are moved relative to each other at a continuous speed, the article is exposed at a plurality of irradiation intensities of an electron beam by changing a transmittance of an electron optical system for forming the electron beam irradiation spot on the article.

REFERENCES:
patent: 5279925 (1994-01-01), Berger et al.
patent: 5382498 (1995-01-01), Berger
patent: 5614725 (1997-03-01), Oae et al.
patent: 5920077 (1999-07-01), Oae et al.
patent: 6069684 (2000-05-01), Golladay et al.
patent: 6118129 (2000-09-01), Oae et al.
patent: 6307826 (2001-10-01), Katsumura et al.
patent: 6901314 (2005-05-01), Mitsui et al.
patent: 2003/0025088 (2003-02-01), Oae et al.
patent: 2004/0170921 (2004-09-01), Katsumura
patent: 2004/0190394 (2004-09-01), Hattori et al.
patent: 2005/0112477 (2005-05-01), Yoshikawa et al.
patent: 52-117547 (1977-10-01), None
patent: 2-237106 (1990-09-01), None
patent: 9-205051 (1997-08-01), None
patent: 11-288535 (1999-10-01), None
patent: 2002-287371 (2002-10-01), None
patent: 2003-51437 (2003-02-01), None
patent: 2003-332217 (2003-11-01), None
International Search Report corresponding to application No. PCT/JP03/13599 dated Feb. 3, 2004.

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