Electron beam exposure method and apparatus

Details Electron beam exposure method and apparatus Electron beam exposure method and apparatus

1986-07-14

1987-07-07

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 3724

Patent

active

046789197

ABSTRACT:
An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variations on the level of the surface of the workpiece due to an elastic deformation thereof during the exposure process. With the use of the correction data, the desired pattern is correctly reproduced as intended when the workpiece is fully supported and the surface thereof recovers its flatness.

REFERENCES:
patent: 4119854 (1978-10-01), Tanaka et al.
patent: 4137459 (1979-01-01), Albrecht et al.
patent: 4390788 (1983-06-01), Hayashi et al.
patent: 4443704 (1984-04-01), Yamashita et al.
H. Smith, "Fabrication Techniques for Surface-Acoustic-Wave and Thin-Film Optical Devices," Proceedings of the IEEE, vol. 62, No. 10, Oct. 1974, pp. 1361-1387.
H. R. Rottmann: "Advances in Contact and Proximity Printing", Kodak Microelectronics Seminar, Proceedings of Interface '74.
Distortion Correction and Deflection Calibration by Means of Laser Interferometry in an Electron Beam Exposure System; Asai et al, J. Vac. Sci. Tech., Nov./Dec. 79.

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