Electron beam exposure method

Details Electron beam exposure method Electron beam exposure method

1978-06-07

1979-04-24

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250492R, A61K 2702

Patent

active

041514220

ABSTRACT:
An electron beam having a narrow rectangular cross section, shaped by two aperture plates and a deflector, is scanned over a workpiece or specimen. The length and width of the narrow rectangular cross section, relative to beam scanning, in accordance with the shape of the pattern being exposed.

REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 3875416 (1975-04-01), Spicer
patent: 3922546 (1975-11-01), Livesay
patent: 4017403 (1977-04-01), Freeman
patent: 4117340 (1978-09-01), Goto et al.

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