Electron beam exposure mask, electron beam exposure method,...

Details Electron beam exposure mask, electron beam exposure method,... Electron beam exposure mask, electron beam exposure method,...

2005-03-01

2005-03-01

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230, C250S492100

Reexamination Certificate

active

06861657

ABSTRACT:
An electron beam exposure mask comprises a main mask and one or more compensation masks. The main mask has a plurality of first defined masks. The compensation mask includes one or more non-defective second defined masks each having a pattern configuration to be formed in a defective among said first defined masks. In performing exposures by using this electron beam exposure mask, first defined masks are used as long as the first defined masks are non-defective, and the second defined mask corresponding to a first defined mask is used when the first defined mask is defective.

REFERENCES:
patent: 5885747 (1999-03-01), Yamasaki et al.
patent: 6090527 (2000-07-01), Yamazaki et al.
patent: 6180289 (2001-01-01), Hirayanagi

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