Electron beam exposure mask and method of manufacturing the same

Details Electron beam exposure mask and method of manufacturing the same Electron beam exposure mask and method of manufacturing the same

1996-01-24

1998-12-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

058494375

ABSTRACT:
In an exposure mask of the present invention, a plurality of opening regions are disposed via crossbeams, each having a size not to be resolved, along peripheral edges of island-like patterns and peninsula-like patterns for shielding transmission of charged particles.

REFERENCES:
patent: 5008553 (1991-04-01), Abe
patent: 5148033 (1992-09-01), Yamada et al.
patent: 5424173 (1995-06-01), Wakabayashi et al.
T.H.P. Chang, "Proximity Effect in Electron-Beam Lithography", J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, pp. 1271-1275.

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