Electron beam exposure equipment and electron beam exposure...

Details Electron beam exposure equipment and electron beam exposure... Electron beam exposure equipment and electron beam exposure...

2005-01-04

2005-01-04

Wells, Nikita (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S492220, C250S492230, C250S3960ML, C250S3960ML, C250S397000

Reexamination Certificate

active

06838682

ABSTRACT:
There is provided an electron beam exposure technique which permits optical adjustment in an electron optics system using a doublet lens necessary for large field projection.Electron beam exposure equipment having a part forming one image by at least two electromagnetic lenses, has means measuring the position of an electron beam near an image plane with changing excitation of at least two lenses at the same time; and control means feeding back the measured result to aligners or the intensity of the lenses.

REFERENCES:
patent: 4798953 (1989-01-01), de Chambost
patent: 6452193 (2002-09-01), Goto
patent: 6593152 (2003-07-01), Nakasuji et al.
patent: 10-106931 (1998-04-01), None
patent: 10-302696 (1998-11-01), None
patent: 10-303095 (1998-11-01), None
Micro Electronic Engineering, vol. 21, 1993, pp. 145-148.

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