Electron-beam exposure device and a method of detecting a mark p

Details Electron-beam exposure device and a method of detecting a mark p Electron-beam exposure device and a method of detecting a mark p

1996-02-13

1998-01-13

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

257797, H01J 37304

Patent

active

057082766

ABSTRACT:
An electron-beam exposure device having at least one deflector for deflecting an electron beam and detecting a position of a position-detection mark with the electron beam includes a plurality of detectors detecting electrons scattered from the position-detection mark, a plurality of amplifiers, each of the amplifiers amplifying an output of a corresponding one of the detectors, and a setting unit for setting amplification factors of the amplifiers such that a magnitude of an output from each of the amplifiers is constant irrespective of a deflected position of the electron beam at a time of detection of the position of the position-detection mark.

REFERENCES:
patent: 3901814 (1975-08-01), Davis et al.
patent: 4443704 (1984-04-01), Yamashita et al.
patent: 5285075 (1994-02-01), Minamide et al.

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