Electron beam exposure device

Details Electron beam exposure device Electron beam exposure device

1997-08-05

1999-08-31

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250423F, 21912127, 313337, H01J 3763

Patent

active

059456833

ABSTRACT:
An electron beam exposure device includes an alignment optical system; an electromagnetic lens system; a stage on which the sample is provided; and an electron gun. The electron gun is comprised of an electron generating source; an electron generating source heating element which generates heat for increasing the temperature of the electron generating source; a supporting member which supports the electron generating source and the electron generating source heating element; and a Wehnelt. The electron beam exposure device is provided with at least one auxiliary heating element located at respective portion thermally connected to the electron generating source heating element.

REFERENCES:
patent: 5854490 (1998-12-01), Ooaeh et al.

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