Electron beam exposure device

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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Details

250398, 2504911, G21K 102, G21K 508

Patent

active

060084952

ABSTRACT:
An electron beam exposure device in which an electron beam from an electron beam source is passed through at least a slit of a first slit assembly. The first slit assembly includes: a base; a bearing assembly; a stage rotatably supported by the base via the bearing assembly; a stage rotation adjusting mechanism; a slit member; and at least one heat transfer path means for transferring heat of the stage to the base, wherein the at least one heat transfer path means enables the rotation of the stage by the stage rotation adjusting mechanism.

REFERENCES:
patent: 4087729 (1978-05-01), Yamazaki et al.
patent: 5177365 (1993-01-01), Yamada
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5681638 (1997-10-01), Korenaga

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